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UTA versus line emission for EUVL : studies on xenon emission at the NIST EBIT
Date Issued
2004-12
Date Available
2012-07-26T15:46:22Z
Abstract
Spectra from xenon ions have been recorded at the NIST EBIT and the emission into a 2% bandwidth at 13.5 nm arising from 4d_5p transitions compared with that from 4d_4f and 4p_4d transitions in Xe XI and also with that obtained from the unresolved transition array (UTA) observed to peak just below 11 nm. It was found that an improvement of a factor of five could be gained in photon yield using the UTA rather than the 4d_5p emission. The results are compared with atomic structure calculations and imply that a significant gain in efficiency should be obtained using tin, in which the emission at 13.5 nm comes from a similar UTA, rather than xenon as an EUVL source material.
Sponsorship
Science Foundation Ireland
Type of Material
Journal Article
Publisher
IOP Publishing
Journal
Journal of Physics D: Applied Physics
Volume
37
Issue
23
Start Page
3225
End Page
3232
Copyright (Published Version)
2004 IOP Publishing
Keywords
Subject – LCSH
Ultraviolet radiation
Extreme ultraviolet lithography
Language
English
Status of Item
Peer reviewed
This item is made available under a Creative Commons License
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