Browsing by Author Dunne, Padraig

Showing results 1 to 12 of 12
Published DateTitleAuthor(s)
2012The effect of viewing angle on the spectral behavior of a Gd plasma source near 6.7 nmO'Gorman, ColmOtsuka, TakamitsuYugami, NoboruJiang, WeihuaEndo, AkiraLi, BowenCummins, T. (Thomas)Dunne, PadraigSokell, EmmaO'Sullivan, GerryHigashiguchi, Takeshi
2012Feasibility study of broad band efficient "water window" sourceHigashiguchi, TakeshiOtsuka, TakamitsuYugami, NoboruEndo, AkiraLi, BowenDunne, PadraigO'Sullivan, Gerry
5-Dec-2011Gd plasma source modeling at 6.7 nm for future lithographyLi, BowenDunne, PadraigHigashiguchi, TakeshiOtsuka, TakamitsuYugami, NoboruJiang, WeihuaEndo, AkiraO'Sullivan, Gerry
2014Laser produced plasmas as a source of ions, protons and X-raysStefanuik, Robert
2012Optimizing conversion efficiency and reducing ion energy in a laser-produced Gd plasmaCummins, T. (Thomas)Otsuka, TakamitsuYugami, NoboruJiang, WeihuaEndo, AkiraLi, BowenO'Gorman, ColmDunne, PadraigSokell, EmmaO'Sullivan, GerryHigashiguchi, Takeshi
22-Aug-2011Scaling of laser produced plasma UTA emission down to 3 nm for next generation lithography and short wavelength imagingLi, BowenEndo, AkiraO'Gorman, ColmOtsuka, TakamitsuCummins, T. (Thomas)Donnelly, TonyKilbane, DeirdreDunne, PadraigO'Sullivan, GerryJiang, WeihuaHigashiguchi, TakeshiYugami, Noboru
7-Oct-2011Shorter-wavelength extreme-UV sources below 10nmHigashiguchi, TakeshiOtsuka, TakamitsuYugami, NoboruJiang, WeihuaEndo, AkiraDunne, PadraigLi, BowenO'Sullivan, Gerry
4-Dec-2009Simplified 1-D calculation of 13.5-nm emission in a tin plasma including radiation transportWhite, John KingstonDunne, PadraigHayden, PatrickO'Sullivan, Gerry
28-Feb-2011Spectral and temporal behavior of an alkali metal plasma extreme ultraviolet source for surface morphology applicationsHigashiguchi, TakeshiYamaguchi, MamiOtsuka, TakamitsuTerauchi, HiromitsuYugami, NoboruYatagai, ToyohikoD'Arcy, RebekahDunne, PadraigO'Sullivan, Gerry
2013Studies of extreme ultraviolet emission from laser produced plasmas, as sources for next generation lithographyCummins, T. (Thomas)
Dec-2010Systematic investigation of self-absorption property and conversion efficiency of 6.7-nm extreme ultraviolet sourcesOtsuka, TakamitsuWhite, JohnKilbane, DeirdreHigashiguchi, TakeshiYugami, NoboruYatagai, ToyohikoJiang, WeihuaEndo, AkiraDunne, PadraigO'Sullivan, Gerry
Dec-2004UTA versus line emission for EUVL : studies on xenon emission at the NIST EBITFahy, KennethDunne, PadraigMcKinney, LukeO'Sullivan, GerrySokell, EmmaWhite, John K.Aguilar, A.Pomeroy, J.M.Tan, J.N.Blagojevi, B.LeBigot, E.-O.Gillaspy, J.D.