Browsing by Author Endo, Akira


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Showing results 3 to 7 of 7 < previous 
Published DateTitleAuthor(s)
5-Dec-2011Gd plasma source modeling at 6.7 nm for future lithographyLi, BowenDunne, PadraigHigashiguchi, TakeshiOtsuka, TakamitsuYugami, NoboruJiang, WeihuaEndo, AkiraO'Sullivan, Gerry
2012Optimizing conversion efficiency and reducing ion energy in a laser-produced Gd plasmaCummins, T. (Thomas)Otsuka, TakamitsuYugami, NoboruJiang, WeihuaEndo, AkiraLi, BowenO'Gorman, ColmDunne, PadraigSokell, EmmaO'Sullivan, GerryHigashiguchi, Takeshi
22-Aug-2011Scaling of laser produced plasma UTA emission down to 3 nm for next generation lithography and short wavelength imagingLi, BowenEndo, AkiraO'Gorman, ColmOtsuka, TakamitsuCummins, T. (Thomas)Donnelly, TonyKilbane, DeirdreDunne, PadraigO'Sullivan, GerryJiang, WeihuaHigashiguchi, TakeshiYugami, Noboru
7-Oct-2011Shorter-wavelength extreme-UV sources below 10nmHigashiguchi, TakeshiOtsuka, TakamitsuYugami, NoboruJiang, WeihuaEndo, AkiraDunne, PadraigLi, BowenO'Sullivan, Gerry
Dec-2010Systematic investigation of self-absorption property and conversion efficiency of 6.7-nm extreme ultraviolet sourcesOtsuka, TakamitsuWhite, JohnKilbane, DeirdreHigashiguchi, TakeshiYugami, NoboruYatagai, ToyohikoJiang, WeihuaEndo, AkiraDunne, PadraigO'Sullivan, Gerry