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- PublicationUTA versus line emission for EUVL : studies on xenon emission at the NIST EBITSpectra from xenon ions have been recorded at the NIST EBIT and the emission into a 2% bandwidth at 13.5 nm arising from 4d_5p transitions compared with that from 4d_4f and 4p_4d transitions in Xe XI and also with that obtained from the unresolved transition array (UTA) observed to peak just below 11 nm. It was found that an improvement of a factor of five could be gained in photon yield using the UTA rather than the 4d_5p emission. The results are compared with atomic structure calculations and imply that a significant gain in efficiency should be obtained using tin, in which the emission at 13.5 nm comes from a similar UTA, rather than xenon as an EUVL source material.
Scopus© Citations 52 376
- PublicationRobust liquid metal collector mirror for EUV and soft X-ray plasma sourcesRecent work in UCD has centred on the development of a liquid metal coating process for EUV and soft X-ray collector optics. The work involves using a room temperature liquid metal coated on a solid metal substrate of the appropriate form. The advances made demonstrate that a stable thin coating film on the interior surface of a rotating optic substrate is possible, and this offers promise as a solution to the problem of producing an atomically flat reflector that remains unspoiled in front of a multi-kilowatt EUV plasma. We report on the results of preliminary EUV tests carried out on a simple focusing liquid metal mirror.
Scopus© Citations 5 642