Now showing 1 - 2 of 2
  • Publication
    Spray deposited NiOx films on ITO substrates as photoactive electrodes for p-type dye-sensitized solar cells
    Spray deposition followed by sintering of nickel oxide (NiO x ) nanoparticles (average diameter: 40 nm) has been chosen as method of deposition of mesoporous NiO x coatings onto indium tin oxide (ITO) substrates. This procedure allows the scalable preparation of NiO x samples with large surface area (~103 times the geometrical area) and its potential for applications such as electrocatalysis or electrochemical solar energy conversion, which require high electroactivity in confined systems. The potential of these NiO x films as semiconducting cathodes for dye-sensitized solar cell (DSC) purposes has been evaluated for 0.3–3-μm-thick films of NiO x sensitized with erythrosine B (ERY). The electrochemical processes involving the NiO x coatings in the pristine and sensitized states were examined and indicated surface confinement as demonstrated by the linear dependence of the current densities with the scan rate of the cyclic voltammetry. Cathodic polarization of NiO x on ITO can also lead to the irreversible reduction of the underlying ITO substrate because of the mesoporous nature of the sintered NiO x film that allows the shunting of ITO to the electrolyte. ITO-based reduction processes alter irreversibly the properties of charge transfer through the ITO/NiOx interface and limit the range of potential to NiO x coatings sintered for DSC purposes.
    Scopus© Citations 35  793
  • Publication
    Deposition and characterization of NiOx coatings by magnetron sputtering for application in dye-sensitized solar cells
    Nickel oxide (NiOx) due to its p-type nature has considerable potential as a photocathodic material in energy conversion devices such as dye-sensitized solar cells (DSSCs). However,NiOx has not been extensively used for this application mainly because of low light harvesting efficiency due to limited dye loading on the coatings. In this study NiOx coatings were deposited using the dc- magnetron sputtering technique from a nickel target in an argon/oxygen plasma. One of the advantages of magnetron sputtering is the ability to control coating properties such as mechanical performance and chemical stoichiometry. It is anticipated that by enhancing the interconnectivity between NiOx particles and by optimizing surface roughness, it may be possible to enhance dye adsorption and increase its ability to absorb visible light. NiOx coatings were deposited onto both silicon wafer and indium tin oxide (ITO) covered glass substrates. The influence of deposition parameters such as pressure, nickel target current and substrate bias voltage were correlated with the coating properties of surface roughness, thickness, crystallographic structure and surface energy. This evaluation was carried out using optical profilometry, spectroscopic ellipsometry, XRD and contact angle measurements respectively. It was observed that deposited coating morphology and roughness were significantly influenced by the deposition parameters. For example increasing the deposition pressure from 0.20 to 0.40 Pa led to an increase in surface roughness (Ra) from 1.6 to 3 nm. Associated with this increase in roughness the surface energy increased from 36 to 61 mN/mm. The NiOx coatings were spectrally sensitized with Rucomplex dye containing -COOH groups as anchoring moieties. The dye adsorptions on NiOx coatings, deposited on ITO substrates, were investigated in transmission mode using UV-vis spectroscopy in the range of 400 – 800 nm. It was observed that for the coatings with the highest surface energy, there was an increase of up to 60 % in the level of dye adsorption. The electroactivity of the NiOx thin films deposited on Ni substrate at 0.4 Pa has been verified through the occurrence of redox processes of reduction and lithium intercalation within the oxide film.
    Scopus© Citations 59  7368