Shorter-wavelength extreme-UV sources below 10nm

Alternative Title
Progress of high-power, UTA based EUV sources for next generation lithography and short wavelength imaging below 10 nm
Author(s)
Uri
Date Issued
2011-10-07
Date Available
2012-04-17T11:37:01Z
Abstract
A next-generation laser-produced plasma system based on rare-earth targets generates strong resonant line emissions at 6.5–6.7nm.
Sponsorship
Science Foundation Ireland
Type of Material
Technical Report
Publisher
SPIE
Copyright (Published Version)
2011 SPIE
Subjects

Plasma

Subject – LCSH
Laser plasmas
Ultraviolet radiation
DOI
Web versions
Language
English
Status of Item
Not peer reviewed
Journal
SPIE Newsroom
This item is made available under a Creative Commons License
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Progress of high-power, UTA based EUV sources for next generation lithography and short wavelength imaging below 10 nm.pdf

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Owning collection
Physics Research Collection