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  5. Evaluation of microwave plasma oxidation treatments for the fabrication of photoactive un-doped and carbon-doped TiO2 coatings
 
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Evaluation of microwave plasma oxidation treatments for the fabrication of photoactive un-doped and carbon-doped TiO2 coatings

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Download Dang et al J Surf Coatings Apr 2012.pdf1.34 MB
Author(s)
Dang, Binh H.Q. 
Rahman, Mahfujur 
MacElroy, J. M. Don 
Dowling, Denis P. 
Uri
http://hdl.handle.net/10197/3744
Date Issued
25 May 2012
Date Available
17T14:07:26Z August 2012
Abstract
The photoactivity of both un-doped and carbon-doped titanium dioxide (TiO2) coatings has been widely reported. In this paper, the use of a microwave plasma as a novel oxidation treatment for the fabrication of these coatings is evaluated. The photoactivity performance of the microwave plasma-formed coatings is benchmarked against those fabricated through air furnace oxidation as well as those deposited using reactive magnetron sputtering. The un-doped and carbon-doped TiO2 coatings were prepared respectively by microwave plasma-oxidizing titanium metal sheets and sputter deposited titanium carbide thin films. The resulting oxides were characterized using XPS, XRD, FEG-SEM, and optical profilometry. The oxide layer thicknesses achieved over the 15 to 45 minute oxidation times were in the range of 0.15 to 3.44 µm. These coatings were considerably thicker than those obtained by air furnace oxidation. The microwave plasma-formed oxides also exhibited significantly higher surface roughness values compared with the magnetron-sputtered coatings. The photoactivity performance of both un-doped and carbon-doped coatings was assessed using photocurrent density measurements. Comparing the un-doped TiO2 coatings, it was observed that those obtained using the microwave plasma oxidation route yielded photocurrent density measurements that were 4.3 times higher than the TiO2 coatings of the same thickness that were deposited by sputtering. The microwave plasma-oxidized titanium carbide coatings did not perform as well as the un-doped TiO2 probably due to the presence of un-oxidized carbide in the coatings, which reduced their photoactivity.
Sponsorship
Science Foundation Ireland
Type of Material
Journal Article
Publisher
Elsevier
Journal
Surface and Coatings Technology
Volume
206
Issue
19-20
Start Page
4113
End Page
4118
Copyright (Published Version)
2012 Elsevier B.V
Keywords
  • Water splitting

  • Sputtering

  • Microwave plasma

  • Titanium dioxide

  • Carbon doping

Subject – LCSH
Sputtering (Physics)
Microwave plasmas
Titanium--Oxidation
Coatings
DOI
10.1016/j.surfcoat.2012.04.003
Language
English
Status of Item
Peer reviewed
This item is made available under a Creative Commons License
https://creativecommons.org/licenses/by-nc-sa/1.0/
Owning collection
Solar Energy Conversion (SEC) Cluster Research Collection
Scopus© citations
33
Acquisition Date
Mar 24, 2023
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Acquisition Date
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