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  5. UTA versus line emission for EUVL : studies on xenon emission at the NIST EBIT
 
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UTA versus line emission for EUVL : studies on xenon emission at the NIST EBIT

Author(s)
Fahy, Kenneth  
Dunne, Padraig  
McKinney, Luke  
O'Sullivan, Gerry  
Sokell, Emma  
White, John K.  
Aguilar, A.  
Pomeroy, J.M.  
Tan, J.N.  
Blagojevi, B.  
LeBigot, E.-O.  
Gillaspy, J.D.  
Uri
http://hdl.handle.net/10197/3728
Date Issued
2004-12
Date Available
2012-07-26T15:46:22Z
Abstract
Spectra from xenon ions have been recorded at the NIST EBIT and the emission into a 2% bandwidth at 13.5 nm arising from 4d_5p transitions compared with that from 4d_4f and 4p_4d transitions in Xe XI and also with that obtained from the unresolved transition array (UTA) observed to peak just below 11 nm. It was found that an improvement of a factor of five could be gained in photon yield using the UTA rather than the 4d_5p emission. The results are compared with atomic structure calculations and imply that a significant gain in efficiency should be obtained using tin, in which the emission at 13.5 nm comes from a similar UTA, rather than xenon as an EUVL source material.
Sponsorship
Science Foundation Ireland
Type of Material
Journal Article
Publisher
IOP Publishing
Journal
Journal of Physics D: Applied Physics
Volume
37
Issue
23
Start Page
3225
End Page
3232
Copyright (Published Version)
2004 IOP Publishing
Subjects

EUV

Subject – LCSH
Ultraviolet radiation
Extreme ultraviolet lithography
DOI
10.1088/0022-3727/37/23/003
Language
English
Status of Item
Peer reviewed
This item is made available under a Creative Commons License
https://creativecommons.org/licenses/by-nc-sa/1.0/
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Journal of Physics D 2004.pdf

Size

420 KB

Format

Adobe PDF

Checksum (MD5)

8a33757b499d4c96d1a285c364917906

Owning collection
Physics Research Collection

Item descriptive metadata is released under a CC-0 (public domain) license: https://creativecommons.org/public-domain/cc0/.
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