Nonlocal photopolymerization kinetics including multiple termination mechanisms and dark reactions. Part II. Experimental validation
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|Title:||Nonlocal photopolymerization kinetics including multiple termination mechanisms and dark reactions. Part II. Experimental validation||Authors:||Gleeson, M. R.
McLeod, Robert R.
Sheridan, John T.
|Permanent link:||http://hdl.handle.net/10197/3424||Date:||19-Aug-2009||Abstract:||In the ﬁrst of this series of papers [J. Opt. Soc. Am. B 26, 1736 (2009)], a new kinetic model, which includes most of the major photochemical and nonlocal photopolymerization driven diffusion effects, was proposed. Predictions made using the model were presented, and the numerical convergence of these simulations were examined when retaining higher-concentration harmonics. The validity and generality of the model is examined by applying it to ﬁt experimental data for two different types of photopolymer material appearing in the literature. The ﬁrst of these photopolymer materials involves an acrylamide monomer in a polyvinylalcohol matrix. The second is a more complex photopolymer in an epoxy resin matrix. Using the new model, key material parameters are extracted by numerically ﬁtting experimentally obtained diffraction efﬁciency growth curves. The growth curves used include data captured both during exposure and post-exposure, allowing examination and analysis of "dark reactions".||Funding Details:||Science Foundation Ireland
Irish Research Council for Science, Engineering and Technology
|Type of material:||Journal Article||Publisher:||Optical Society of America||Copyright (published version):||2009 Optical Society of America||Subject LCSH:||Photopolymerization
Holographic storage devices (Computer science)
|DOI:||10.1364/JOSAB.26.001746||Language:||en||Status of Item:||Not peer reviewed|
|Appears in Collections:||Electrical and Electronic Engineering Research Collection|
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