Gd plasma source modeling at 6.7 nm for future lithography

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Title: Gd plasma source modeling at 6.7 nm for future lithography
Authors: Li, Bowen
Dunne, Padraig
Higashiguchi, Takeshi
Otsuka, Takamitsu
Yugami, Noboru
Jiang, Weihua
Endo, Akira
O'Sullivan, Gerry
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Date: 5-Dec-2011
Online since: 2012-04-17T08:35:07Z
Abstract: Plasmas containing gadolinium have been proposed as sources for next generation lithography at 6.x nm. To determine the optimum plasma conditions, atomic structure calculations have been performed for Gd11+ to Gd27+ ions which showed that n=4 - n=4 resonance transitions overlap in the 6.5 – 7.0 nm region. Plasma modeling calculations, assuming collisional-radiative equilibrium, predict that the optimum temperature for an optically thin plasma is close to 110 eV and that maximum intensity occurs at 6.76 nm under these conditions. The close agreement observed between simulated and experimental spectra from laser and discharge produced plasmas indicates the validity of our approach.
Funding Details: Science Foundation Ireland
Type of material: Journal Article
Publisher: American Institute of Physics
Journal: Applied Physics Letters
Volume: 99
Issue: 23
Start page: 231502
Copyright (published version): 2011 American Institute of Physics
Keywords: Plasma
Subject LCSH: Laser plasmas
DOI: 10.1063/1.3666042
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Language: en
Status of Item: Peer reviewed
Appears in Collections:Physics Research Collection

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