Scaling of laser produced plasma UTA emission down to 3 nm for next generation lithography and short wavelength imaging

Title: Scaling of laser produced plasma UTA emission down to 3 nm for next generation lithography and short wavelength imaging
Authors: Li, Bowen
Endo, Akira
O'Gorman, Colm
Otsuka, Takamitsu
Cummins, T. (Thomas)
Donnelly, Tony
Kilbane, Deirdre
Dunne, Padraig
O'Sullivan, Gerry
Jiang, Weihua
Higashiguchi, Takeshi
Yugami, Noboru
Permanent link: http://hdl.handle.net/10197/3566
Date: 22-Aug-2011
Abstract: An engineering prototype high average power 13.5-nm source has been shipped to semiconductor facilities to permit the commencement of high volume production at a 100 W power level in 2011. In this source, UTA (unresolved transition array) emission of highly ionized Sn is optimized for high conversion efficiency and full recovery of the injected fuel is realized through ion deflection in a magnetic field. By use of a low-density target, satellite emission is suppressed and full ionization attained with short pulse CO2 laser irradiation. The UTA is scalable to shorter wavelengths, and Gd is shown to have similar conversion efficiency to Sn (13.5 nm) at a higher plasma temperature, with a narrow spectrum centered at 6.7 nm, where a 70% reflectivity mirror is anticipated. Optimization of short pulse CO2 laser irradiation is studied, and further extension of the same method is discussed, to realize 100 W average power down to a wavelength of 3 nm
Funding Details: Science Foundation Ireland
Type of material: Conference Publication
Publisher: Society of Photo-optical Instrumentation Engineers
Copyright (published version): 2011 SPIE
Keywords: Extreme ultraviolet;Water window;Unresolved transition array;Rare-earth;LLP
Subject LCSH: Ultraviolet radiation
Lithography
Laser plasmas
Rare earths
DOI: 10.1117/12.892513
Language: en
Status of Item: Not peer reviewed
Is part of: Proceedings of the SPIE, Volume 8139 Advances in X-Ray/EUV Optics and Components VI, San Diego, California, 22nd August 2011
Conference Details: Presented at a poster session at Advances in X-Ray/EUV Optics and Components VI, Monday 22 August 2011, San Diego, California, USA
Appears in Collections:Physics Research Collection

Show full item record

SCOPUSTM   
Citations 50

7
Last Week
0
Last month
checked on Jun 22, 2018

Google ScholarTM

Check

Altmetric


This item is available under the Attribution-NonCommercial-NoDerivs 3.0 Ireland. No item may be reproduced for commercial purposes. For other possible restrictions on use please refer to the publisher's URL where this is made available, or to notes contained in the item itself. Other terms may apply.