Shorter-wavelength extreme-UV sources below 10nm

Title: Shorter-wavelength extreme-UV sources below 10nm
Authors: Higashiguchi, Takeshi
Otsuka, Takamitsu
Yugami, Noboru
Jiang, Weihua
Endo, Akira
Dunne, Padraig
Li, Bowen
O'Sullivan, Gerry
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Date: 7-Oct-2011
Online since: 2012-04-17T11:37:01Z
Abstract: A next-generation laser-produced plasma system based on rare-earth targets generates strong resonant line emissions at 6.5–6.7nm.
Funding Details: Science Foundation Ireland
Type of material: Technical Report
Publisher: SPIE
Copyright (published version): 2011 SPIE
Keywords: Plasma
Subject LCSH: Laser plasmas
Ultraviolet radiation
DOI: 10.1117/2.1201109.003765
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Language: en
Status of Item: Not peer reviewed
Is part of: SPIE Newsroom
Appears in Collections:Physics Research Collection

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