UTA versus line emission for EUVL : studies on xenon emission at the NIST EBIT

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Title: UTA versus line emission for EUVL : studies on xenon emission at the NIST EBIT
Authors: Fahy, Kenneth
Dunne, Padraig
McKinney, Luke
O'Sullivan, Gerry
Sokell, Emma
White, John K.
Aguilar, A.
Pomeroy, J.M.
Tan, J.N.
Blagojevi, B.
LeBigot, E.-O.
Gillaspy, J.D.
Permanent link: http://hdl.handle.net/10197/3728
Date: Dec-2004
Abstract: Spectra from xenon ions have been recorded at the NIST EBIT and the emission into a 2% bandwidth at 13.5 nm arising from 4d_5p transitions compared with that from 4d_4f and 4p_4d transitions in Xe XI and also with that obtained from the unresolved transition array (UTA) observed to peak just below 11 nm. It was found that an improvement of a factor of five could be gained in photon yield using the UTA rather than the 4d_5p emission. The results are compared with atomic structure calculations and imply that a significant gain in efficiency should be obtained using tin, in which the emission at 13.5 nm comes from a similar UTA, rather than xenon as an EUVL source material.
Funding Details: Science Foundation Ireland
Type of material: Journal Article
Publisher: IOP Publishing
Copyright (published version): 2004 IOP Publishing
Keywords: EUV
Subject LCSH: Ultraviolet radiation
Extreme ultraviolet lithography
DOI: 10.1088/0022-3727/37/23/003
Language: en
Status of Item: Peer reviewed
Appears in Collections:Physics Research Collection

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