Robust liquid metal collector mirror for EUV and soft X-ray plasma sources

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Title: Robust liquid metal collector mirror for EUV and soft X-ray plasma sources
Authors: Fahy, Kenneth
O'Reilly, Fergal
Scally, Enda
Sheridan, Paul
Permanent link: http://hdl.handle.net/10197/3752
Date: 2-Aug-2010
Abstract: Recent work in UCD has centred on the development of a liquid metal coating process for EUV and soft X-ray collector optics. The work involves using a room temperature liquid metal coated on a solid metal substrate of the appropriate form. The advances made demonstrate that a stable thin coating film on the interior surface of a rotating optic substrate is possible, and this offers promise as a solution to the problem of producing an atomically flat reflector that remains unspoiled in front of a multi-kilowatt EUV plasma. We report on the results of preliminary EUV tests carried out on a simple focusing liquid metal mirror.
Funding Details: Science Foundation Ireland
Type of material: Conference Publication
Publisher: SPIE
Copyright (published version): 2010 SPIE
Keywords: Collector mirror;Liquid metal;Extreme-ultraviolet;Soft X-ray;Semiconductor metrology;EUV lithography
Subject LCSH: Liquid metals
Ultraviolet radiation
Grenz rays
Semiconductors
Extreme ultraviolet lithography
DOI: 10.1117/12.860747
Language: en
Status of Item: Not peer reviewed
Is part of: Goto, S., Khounary, A.M., Morawe, C. (eds.). Proceedings of SPIE : Volume 7802 : Advances in X-Ray/EUV Optics and Components V
Conference Details: Advances in X-Ray/EUV Optics and Components V, 2–3 August 2010 San Diego, California, United States
Appears in Collections:Physics Research Collection

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