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  5. Dual mode control of the rotational grinding process
 
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Dual mode control of the rotational grinding process

File(s)
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Download CIRP Paper Final+ 3 3 12.pdf2.41 MB
Author(s)
Ahearne, Eamonn 
Logan, D. 
Byrne, Gerald 
Uri
http://hdl.handle.net/10197/4840
Date Issued
January 2012
Date Available
05T12:07:51Z November 2013
Abstract
The rotational grinding process enables the production of substrates to meet the submicron planarity specifications required for micro-fabrication of semiconductor integrated circuits. Improvements in process capability, with respect to both form and finish, have been generally realised by the development of machine tools and systems based on a principle of precise and predictable “position” control. An alternative principle for optimisation is demonstrated here comprising a dual mode control system where a “finishing mode” is based on local normal force control. Test results show significant relative improvements in levels of surface roughness and a reduction in the normal spatial variation.
Type of Material
Journal Article
Publisher
Elsevier
Journal
CIRP Annals - Manufacturing Technology
Volume
61
Issue
1
Start Page
303
End Page
306
Copyright (Published Version)
2012 Elsevier
Keywords
  • Grinding

  • Control

  • Silicon

DOI
10.1016/j.cirp.2012.03.095
Language
English
Status of Item
Peer reviewed
This item is made available under a Creative Commons License
https://creativecommons.org/licenses/by-nc-nd/3.0/ie/
Owning collection
Mechanical & Materials Engineering Research Collection
Scopus© citations
2
Acquisition Date
Jan 30, 2023
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1678
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Jan 30, 2023
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Downloads
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