Deposition of nano and micron thick aligned fiber plasma polymerised coatings using an atmospheric plasma jet technique

Title: Deposition of nano and micron thick aligned fiber plasma polymerised coatings using an atmospheric plasma jet technique
Authors: Dowling, Denis P.
Stallard, Charlie P.
Permanent link: http://hdl.handle.net/10197/5259
Date: Jul-2011
Abstract: This paper reports on the deposition of siloxane coatings exhibiting ‘aligned’ and ‘non-aligned’ fibrous structures using an atmospheric plasma jet system called PlasmaStreamTM. The coatings were deposited from both liquid HMDSO and TCFS (tetramethyl cyclotetrasiloxane / fluorosiloxane) precursors. These precursors were nebulized into a helium / nitrogen plasma and the coatings were deposited onto silicon wafer substrates. By controlling the deposition conditions superhydrophobic coatings exhibiting a needle-like coating morphology was obtained from both precursors. Initial fibre lengths were in the nm range but after longer deposition time’s coatings with micron long fibre lengths were obtained. In the case of the HMDSO precursor individual aligned fibres with diameters of up to 300 nm and lengths of up to 12 μm were observed. The TCFS coatings were structurally different as they exhibited a non-aligned, more densely packed, fibrous structures. For the same deposition time as used with HMDSO, the TCFS coatings exhibited fibre lengths of up to 10 microns. Coating morphology, water contact angle and functional chemistry were examined using optical profilometry, contact angle and FTIR techniques respectively. The micron thick fibrous coatings both exhibited superhydrophobic properties with contact angles of over 150°.
Funding Details: Science Foundation Ireland
Type of material: Conference Publication
Publisher: International Symposium on Plasma Chemistry
Copyright (published version): 2011 the authors
Keywords: Aligned fibre;Superhydrophobic;Siloxane coatings;Atmospheric plasma
Language: en
Status of Item: Peer reviewed
Conference Details: International Symposium on Plasma Chemistry (ISPC20), Philadelphia, USA, July 24 - 29, 2011
Appears in Collections:Mechanical & Materials Engineering Research Collection

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